|
| MOQ: | 1kg |
| Price: | US $500/kg |
| Standard Packaging: | Cylinder/Tank |
| Delivery Period: | 15 days |
| Payment Method: | L/C, T/T |
| Supply Capacity: | 2000 Tons/Year |
NF3 gas refers to nitrogen trifluoride in its gaseous state. Nitrogen trifluoride (NF3) is a colorless and odorless gas at room temperature. It is commonly used in various industrial applications due to its unique properties. Here are some key points about NF3 gas:
Chemical Composition: NF3 consists of one nitrogen (N) atom bonded to three fluorine (F) atoms. Its chemical formula is NF3.
Physical Properties: NF3 is a non-flammable gas with a boiling point of -129 degrees Celsius (-200 degrees Fahrenheit) and a melting point of -206 degrees Celsius (-339 degrees Fahrenheit). It is slightly denser than air and remains in a gaseous state at room temperature and normal atmospheric pressure.
Uses: NF3 gas has several industrial applications:
Electronics Manufacturing: It is commonly used in the electronics industry as a cleaning agent for removing residues from silicon wafers, chambers, and other electronic components during the manufacturing process. NF3 gas is preferred due to its low reactivity with many materials and its ability to remove fluorinated compounds effectively.
Plasma Etching: NF3 is utilized as a plasma etchant in the semiconductor industry. It is used to selectively remove materials from the surface of silicon wafers and other substrates during the fabrication of microelectronics.
Flat Panel Display Manufacturing: NF3 gas is also employed in the production of flat panel displays, such as liquid crystal displays (LCDs) and plasma displays. It is used for cleaning and etching processes during the manufacturing of these displays.
Solar Panels: NF3 finds application in the production of thin-film photovoltaic cells used in solar panels.
Fluorinating Agent: It can be used as a fluorinating agent in various chemical reactions to introduce fluorine atoms into organic molecules.
Safety Considerations: While NF3 is not flammable, it is still important to handle it with care and follow proper safety measures. NF3 gas is not toxic in low concentrations; however, it can displace oxygen in confined spaces, leading to asphyxiation. Adequate ventilation should be ensured when working with NF3 gas, and appropriate safety guidelines and equipment should be followed.
When handling NF3 gas, it is recommended to adhere to safety protocols, use proper protective equipment, and ensure good ventilation in the working area to maintain a safe environment.
Basic Info
| Transport Package: | 47L, 440L | Melting Point | -206.79ºC |
| Trademark: | CMC | Boiling Point | -129.0ºC |
| Specification | 100.00% | Production Capacity | 5000tons/Year |
| Cylinder Pressure | 15MPa/20MPa | Valve | Qf-30A/Cga350 |
| Appearance | Colorless, Odorless | Density | 2.96 Kg/M3 |
Specifications:
| Specifications | Company Standard |
| NF3 | ≥ 99.996% |
| CF4 | ≤ 20 ppm |
| N2 | ≤ 5 ppm |
| O2+AR | ≤ 3 ppm |
| CO | ≤ 1 ppm |
| CO2 | ≤ 0.5 ppm |
| N2O | ≤ 1 ppm |
| SF6 | ≤ 2 ppm |
| Moisture | ≤ 1 ppm |
| Express as HF | ≤ 1 ppm |
Detailed Photo
|
|
| MOQ: | 1kg |
| Price: | US $500/kg |
| Standard Packaging: | Cylinder/Tank |
| Delivery Period: | 15 days |
| Payment Method: | L/C, T/T |
| Supply Capacity: | 2000 Tons/Year |
NF3 gas refers to nitrogen trifluoride in its gaseous state. Nitrogen trifluoride (NF3) is a colorless and odorless gas at room temperature. It is commonly used in various industrial applications due to its unique properties. Here are some key points about NF3 gas:
Chemical Composition: NF3 consists of one nitrogen (N) atom bonded to three fluorine (F) atoms. Its chemical formula is NF3.
Physical Properties: NF3 is a non-flammable gas with a boiling point of -129 degrees Celsius (-200 degrees Fahrenheit) and a melting point of -206 degrees Celsius (-339 degrees Fahrenheit). It is slightly denser than air and remains in a gaseous state at room temperature and normal atmospheric pressure.
Uses: NF3 gas has several industrial applications:
Electronics Manufacturing: It is commonly used in the electronics industry as a cleaning agent for removing residues from silicon wafers, chambers, and other electronic components during the manufacturing process. NF3 gas is preferred due to its low reactivity with many materials and its ability to remove fluorinated compounds effectively.
Plasma Etching: NF3 is utilized as a plasma etchant in the semiconductor industry. It is used to selectively remove materials from the surface of silicon wafers and other substrates during the fabrication of microelectronics.
Flat Panel Display Manufacturing: NF3 gas is also employed in the production of flat panel displays, such as liquid crystal displays (LCDs) and plasma displays. It is used for cleaning and etching processes during the manufacturing of these displays.
Solar Panels: NF3 finds application in the production of thin-film photovoltaic cells used in solar panels.
Fluorinating Agent: It can be used as a fluorinating agent in various chemical reactions to introduce fluorine atoms into organic molecules.
Safety Considerations: While NF3 is not flammable, it is still important to handle it with care and follow proper safety measures. NF3 gas is not toxic in low concentrations; however, it can displace oxygen in confined spaces, leading to asphyxiation. Adequate ventilation should be ensured when working with NF3 gas, and appropriate safety guidelines and equipment should be followed.
When handling NF3 gas, it is recommended to adhere to safety protocols, use proper protective equipment, and ensure good ventilation in the working area to maintain a safe environment.
Basic Info
| Transport Package: | 47L, 440L | Melting Point | -206.79ºC |
| Trademark: | CMC | Boiling Point | -129.0ºC |
| Specification | 100.00% | Production Capacity | 5000tons/Year |
| Cylinder Pressure | 15MPa/20MPa | Valve | Qf-30A/Cga350 |
| Appearance | Colorless, Odorless | Density | 2.96 Kg/M3 |
Specifications:
| Specifications | Company Standard |
| NF3 | ≥ 99.996% |
| CF4 | ≤ 20 ppm |
| N2 | ≤ 5 ppm |
| O2+AR | ≤ 3 ppm |
| CO | ≤ 1 ppm |
| CO2 | ≤ 0.5 ppm |
| N2O | ≤ 1 ppm |
| SF6 | ≤ 2 ppm |
| Moisture | ≤ 1 ppm |
| Express as HF | ≤ 1 ppm |
Detailed Photo
