|
| MOQ: | 1kg |
| Price: | US $500/kg |
| Standard Packaging: | Cylinder/Tank |
| Delivery Period: | 15 days |
| Payment Method: | L/C, T/T |
| Supply Capacity: | 20000 Tons/Year |
Trichlorosilane (SiHCl3) is a chemical compound composed of one silicon atom bonded to three chlorine atoms and one hydrogen atom. It is a colorless, volatile liquid at room temperature. Here are some key points about trichlorosilane:
Chemical Composition: Trichlorosilane consists of one silicon (Si) atom bonded to three chlorine (Cl) atoms and one hydrogen (H) atom. Its chemical formula is SiHCl3.
Properties: Trichlorosilane is a low-boiling, volatile liquid with a boiling point of -31.8 degrees Celsius (-25.2 degrees Fahrenheit). It has a pungent odor and is highly reactive. Trichlorosilane readily decomposes in the presence of water or moisture, releasing hydrogen chloride gas (HCl) and forming silicon dioxide (SiO2).
Production: Trichlorosilane is primarily produced through the reaction of metallurgical-grade silicon with hydrogen chloride gas:
Si + 3HCl → SiHCl3 + H2
This reaction typically takes place at high temperatures in the presence of a catalyst, such as copper.
Uses: Trichlorosilane has various industrial applications, particularly in the production of silicon-based materials:
Silicon Production: Trichlorosilane is a key precursor in the production of high-purity silicon. It is reacted with hydrogen gas (H2) in a chemical vapor deposition (CVD) process to deposit silicon onto a substrate, such as a silicon wafer, for semiconductor manufacturing.
Silicones: Trichlorosilane is used as a starting material in the synthesis of silicones, which are polymers with silicon-oxygen backbone structures. Silicones have diverse applications, including in sealants, adhesives, lubricants, and medical devices.
Chemical Synthesis: Trichlorosilane can be used as a reagent or intermediate in the synthesis of various silicon compounds, such as silanes and silicates.
Safety Considerations: Trichlorosilane is highly reactive and can decompose in the presence of water or moisture, releasing hydrogen chloride gas. It is also flammable and should be handled with appropriate precautions. Proper safety measures, such as working in a well-ventilated area and using protective equipment, should be followed when working with trichlorosilane.
It's important to handle trichlorosilane with care and adhere to safety guidelines to mitigate potential risks associated with its reactivity and flammability.
Basic Info.
| Model NO. | SiHCl3 | Grade Standard | Electron Grade |
| Transport Package | Canister, Cylinder | Specification | 40L, 200L |
| Trademark | CMC | Origin | Suzhou |
| HS Code | 2812190091 | Production Capacity | 1000t/Year |
Specifications:
| Test items | Unit | Test Result | |
| Components | Purity | % | 99.990 |
| Other CHLOROSILANE | % | 0.010 | |
Impurities |
Co | ppb | 0.01 |
| Cr | ppb | 0.01 | |
| Cu | ppb | 0.01 | |
| Fe | ppb | 0.06 | |
| Mn | ppb | 0.01 | |
| Ni | ppb | 0.01 | |
| V | ppb | 0.01 | |
| B | ppb | 0.01 | |
| Al | ppb | 0.01 | |
| P | ppb | 0.01 | |
| As | ppb | 0.01 | |
| Mo | ppb | 0.01 | |
| Total metal impurities | ppb | <1.00 | |
| P+As | ppb | 0.02 | |
| C | ppm | <0.01 | |
| Gas Density | / | 4.7 | |
|
|
| MOQ: | 1kg |
| Price: | US $500/kg |
| Standard Packaging: | Cylinder/Tank |
| Delivery Period: | 15 days |
| Payment Method: | L/C, T/T |
| Supply Capacity: | 20000 Tons/Year |
Trichlorosilane (SiHCl3) is a chemical compound composed of one silicon atom bonded to three chlorine atoms and one hydrogen atom. It is a colorless, volatile liquid at room temperature. Here are some key points about trichlorosilane:
Chemical Composition: Trichlorosilane consists of one silicon (Si) atom bonded to three chlorine (Cl) atoms and one hydrogen (H) atom. Its chemical formula is SiHCl3.
Properties: Trichlorosilane is a low-boiling, volatile liquid with a boiling point of -31.8 degrees Celsius (-25.2 degrees Fahrenheit). It has a pungent odor and is highly reactive. Trichlorosilane readily decomposes in the presence of water or moisture, releasing hydrogen chloride gas (HCl) and forming silicon dioxide (SiO2).
Production: Trichlorosilane is primarily produced through the reaction of metallurgical-grade silicon with hydrogen chloride gas:
Si + 3HCl → SiHCl3 + H2
This reaction typically takes place at high temperatures in the presence of a catalyst, such as copper.
Uses: Trichlorosilane has various industrial applications, particularly in the production of silicon-based materials:
Silicon Production: Trichlorosilane is a key precursor in the production of high-purity silicon. It is reacted with hydrogen gas (H2) in a chemical vapor deposition (CVD) process to deposit silicon onto a substrate, such as a silicon wafer, for semiconductor manufacturing.
Silicones: Trichlorosilane is used as a starting material in the synthesis of silicones, which are polymers with silicon-oxygen backbone structures. Silicones have diverse applications, including in sealants, adhesives, lubricants, and medical devices.
Chemical Synthesis: Trichlorosilane can be used as a reagent or intermediate in the synthesis of various silicon compounds, such as silanes and silicates.
Safety Considerations: Trichlorosilane is highly reactive and can decompose in the presence of water or moisture, releasing hydrogen chloride gas. It is also flammable and should be handled with appropriate precautions. Proper safety measures, such as working in a well-ventilated area and using protective equipment, should be followed when working with trichlorosilane.
It's important to handle trichlorosilane with care and adhere to safety guidelines to mitigate potential risks associated with its reactivity and flammability.
Basic Info.
| Model NO. | SiHCl3 | Grade Standard | Electron Grade |
| Transport Package | Canister, Cylinder | Specification | 40L, 200L |
| Trademark | CMC | Origin | Suzhou |
| HS Code | 2812190091 | Production Capacity | 1000t/Year |
Specifications:
| Test items | Unit | Test Result | |
| Components | Purity | % | 99.990 |
| Other CHLOROSILANE | % | 0.010 | |
Impurities |
Co | ppb | 0.01 |
| Cr | ppb | 0.01 | |
| Cu | ppb | 0.01 | |
| Fe | ppb | 0.06 | |
| Mn | ppb | 0.01 | |
| Ni | ppb | 0.01 | |
| V | ppb | 0.01 | |
| B | ppb | 0.01 | |
| Al | ppb | 0.01 | |
| P | ppb | 0.01 | |
| As | ppb | 0.01 | |
| Mo | ppb | 0.01 | |
| Total metal impurities | ppb | <1.00 | |
| P+As | ppb | 0.02 | |
| C | ppm | <0.01 | |
| Gas Density | / | 4.7 | |
