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Trichlorosilane A Key Material in The Semiconductor Industry Application Usage Sihcl3

Trichlorosilane A Key Material in The Semiconductor Industry Application Usage Sihcl3

MOQ: 1kg
Price: US $500/kg
Standard Packaging: Cylinder/Tank
Delivery Period: 30 days
Payment Method: L/C, T/T
Supply Capacity: 2000 Tons/Year
Detail Information
Place of Origin
China
Brand Name
CMC
Certification
COA
Model Number
Sihcl3
Product Name:
Trichlorosilane
Purity:
99.99%
Grade:
Electron Grade
Transport:
By Sea
Model No:
Sihcl3
Transport Package:
Tanker
Specification:
Y-Cylinder
Trademark:
CMC
Origin:
China
HS Code:
2812190091
Supply Ability:
500ton/Month
CAS No.:
10025-78-2
Formula:
Sihcl3
EINECS:
7783-82-6
Constituent:
Industrial Pure Air
Grade Standard:
Industrial Grade
Chemical Property:
Non-Flammable Gas
Customization:
Available | Customized Request
Minimum Order Quantity:
1kg
Price:
US $500/kg
Packaging Details:
Cylinder/Tank
Delivery Time:
30 days
Payment Terms:
L/C, T/T
Supply Ability:
2000 Tons/Year
Highlight:

Sihcl3 compressed gas cylinder

,

Trichlorosilane compressed gas cylinder

,

Trichlorosilane natural gas cylinder

Product Description

Product Description

Trichlorosilane (SiHCl3) is a chemical compound composed of one silicon atom bonded to three chlorine atoms and one hydrogen atom. It is a colorless, volatile liquid at room temperature. Here are some key points about trichlorosilane:

  1. Chemical Composition: Trichlorosilane consists of one silicon (Si) atom bonded to three chlorine (Cl) atoms and one hydrogen (H) atom. Its chemical formula is SiHCl3.

  2. Properties: Trichlorosilane is a volatile liquid that boils at around 31.8 degrees Celsius (89.2 degrees Fahrenheit) and has a melting point of -122 degrees Celsius (-187.6 degrees Fahrenheit). It is highly reactive and flammable. Trichlorosilane readily decomposes in the presence of moisture or water, releasing hydrogen gas and forming silicic acid.

  3. Production: Trichlorosilane is primarily produced through the reaction of metallurgical-grade silicon (usually in the form of chunks or powder) with hydrogen chloride (HCl) gas at high temperatures:

    Si + 3HCl → SiHCl3 + H2

    This reaction typically occurs in the presence of a catalyst and is conducted in a closed system.

  4. Uses: Trichlorosilane has various industrial applications:

    • Silicon Production: It is a key intermediate in the production of high-purity silicon. Trichlorosilane is used as a precursor in the Siemens process or the modified Siemens process, which involves the production of polycrystalline silicon for use in semiconductors and solar cells.

    • Chemical Synthesis: Trichlorosilane is used as a source of silicon in the synthesis of various silicon compounds, including silicones, silanes, and silicon carbide.

    • Hydrogen Production: Trichlorosilane can be used as a source of hydrogen gas through its reaction with water vapor or steam:

      SiHCl3 + 3H2O → SiO2 + 3H2 + 3HCl

      This reaction generates hydrogen gas for various industrial applications.

    • Metal Surface Treatment: Trichlorosilane is used as a surface treatment agent for metals to improve adhesion or provide a protective coating.

  5. Safety Considerations: Trichlorosilane is a flammable liquid and should be handled with caution. It reacts vigorously with water, releasing hydrogen gas and forming corrosive silicic acid. Trichlorosilane vapors are also toxic and can cause respiratory irritation. Proper safety precautions, such as appropriate ventilation, protective equipment, and safe handling procedures, should be followed when working with trichlorosilane.

It's important to handle trichlorosilane safely and follow proper protocols to minimize risks associated with its reactivity, flammability, and potential health hazards.

 

Basic Info.

Model No: SiHCl3 Quality Electron Grade
Transport Package Y-Cylinder, T-Drum, Tt, Tanker Specification 20L, 40L, 280L and customizable
Trademark CMC Origin Suzhou, China
HS Code 2812190091 Production Capacity 500ton/Month

Specification:


Trichlorosilane is a silicon precursor for epitaxial silicon-containing thin films, especially for the
preparation of starting wafers.

China High Puritytrichlorosilane Gas 99.99% 4n Sihcl3 Gas

Detailed Photo

 

                                Trichlorosilane A Key Material in The Semiconductor Industry Application Usage Sihcl3 1


 

Company Profile

China High Puritytrichlorosilane Gas 99.99% 4n Sihcl3 Gas

Shanghai Kemike Chemical Co., Ltd is staffed by trained personnel, combine many years experience in Gas industry .We supply cylinder gas, electronic gas, etc ., and the gas holder, panel, valves and fittings and other equipment, parts and engineering services to our customers in China and worldwide; The products are involved in various industrial fields, such as semiconductor chip, solar cell, LED, TFT-LCD, optical fiber, glass, laser, medicine , etc., Our mission is to partner with our global customers to provide support, solutions and quality products that are innovative,reliable, and safe.
Our products mainly include: H2, O2, N2, Ar, CO2, propane, acetylene, helium, laser mixed gas,  SiH4, Sih2cl2, SiHCL3, SiCL4, NH3, CF4, NF3, SF6, HCL, N2O, doping mixed gas (TMB, PH3, B2H6) and other electronic gases.

China High Puritytrichlorosilane Gas 99.99% 4n Sihcl3 Gas
China High Puritytrichlorosilane Gas 99.99% 4n Sihcl3 Gas
 

products
PRODUCTS DETAILS
Trichlorosilane A Key Material in The Semiconductor Industry Application Usage Sihcl3
MOQ: 1kg
Price: US $500/kg
Standard Packaging: Cylinder/Tank
Delivery Period: 30 days
Payment Method: L/C, T/T
Supply Capacity: 2000 Tons/Year
Detail Information
Place of Origin
China
Brand Name
CMC
Certification
COA
Model Number
Sihcl3
Product Name:
Trichlorosilane
Purity:
99.99%
Grade:
Electron Grade
Transport:
By Sea
Model No:
Sihcl3
Transport Package:
Tanker
Specification:
Y-Cylinder
Trademark:
CMC
Origin:
China
HS Code:
2812190091
Supply Ability:
500ton/Month
CAS No.:
10025-78-2
Formula:
Sihcl3
EINECS:
7783-82-6
Constituent:
Industrial Pure Air
Grade Standard:
Industrial Grade
Chemical Property:
Non-Flammable Gas
Customization:
Available | Customized Request
Minimum Order Quantity:
1kg
Price:
US $500/kg
Packaging Details:
Cylinder/Tank
Delivery Time:
30 days
Payment Terms:
L/C, T/T
Supply Ability:
2000 Tons/Year
Highlight

Sihcl3 compressed gas cylinder

,

Trichlorosilane compressed gas cylinder

,

Trichlorosilane natural gas cylinder

Product Description

Product Description

Trichlorosilane (SiHCl3) is a chemical compound composed of one silicon atom bonded to three chlorine atoms and one hydrogen atom. It is a colorless, volatile liquid at room temperature. Here are some key points about trichlorosilane:

  1. Chemical Composition: Trichlorosilane consists of one silicon (Si) atom bonded to three chlorine (Cl) atoms and one hydrogen (H) atom. Its chemical formula is SiHCl3.

  2. Properties: Trichlorosilane is a volatile liquid that boils at around 31.8 degrees Celsius (89.2 degrees Fahrenheit) and has a melting point of -122 degrees Celsius (-187.6 degrees Fahrenheit). It is highly reactive and flammable. Trichlorosilane readily decomposes in the presence of moisture or water, releasing hydrogen gas and forming silicic acid.

  3. Production: Trichlorosilane is primarily produced through the reaction of metallurgical-grade silicon (usually in the form of chunks or powder) with hydrogen chloride (HCl) gas at high temperatures:

    Si + 3HCl → SiHCl3 + H2

    This reaction typically occurs in the presence of a catalyst and is conducted in a closed system.

  4. Uses: Trichlorosilane has various industrial applications:

    • Silicon Production: It is a key intermediate in the production of high-purity silicon. Trichlorosilane is used as a precursor in the Siemens process or the modified Siemens process, which involves the production of polycrystalline silicon for use in semiconductors and solar cells.

    • Chemical Synthesis: Trichlorosilane is used as a source of silicon in the synthesis of various silicon compounds, including silicones, silanes, and silicon carbide.

    • Hydrogen Production: Trichlorosilane can be used as a source of hydrogen gas through its reaction with water vapor or steam:

      SiHCl3 + 3H2O → SiO2 + 3H2 + 3HCl

      This reaction generates hydrogen gas for various industrial applications.

    • Metal Surface Treatment: Trichlorosilane is used as a surface treatment agent for metals to improve adhesion or provide a protective coating.

  5. Safety Considerations: Trichlorosilane is a flammable liquid and should be handled with caution. It reacts vigorously with water, releasing hydrogen gas and forming corrosive silicic acid. Trichlorosilane vapors are also toxic and can cause respiratory irritation. Proper safety precautions, such as appropriate ventilation, protective equipment, and safe handling procedures, should be followed when working with trichlorosilane.

It's important to handle trichlorosilane safely and follow proper protocols to minimize risks associated with its reactivity, flammability, and potential health hazards.

 

Basic Info.

Model No: SiHCl3 Quality Electron Grade
Transport Package Y-Cylinder, T-Drum, Tt, Tanker Specification 20L, 40L, 280L and customizable
Trademark CMC Origin Suzhou, China
HS Code 2812190091 Production Capacity 500ton/Month

Specification:


Trichlorosilane is a silicon precursor for epitaxial silicon-containing thin films, especially for the
preparation of starting wafers.

China High Puritytrichlorosilane Gas 99.99% 4n Sihcl3 Gas

Detailed Photo

 

                                Trichlorosilane A Key Material in The Semiconductor Industry Application Usage Sihcl3 1


 

Company Profile

China High Puritytrichlorosilane Gas 99.99% 4n Sihcl3 Gas

Shanghai Kemike Chemical Co., Ltd is staffed by trained personnel, combine many years experience in Gas industry .We supply cylinder gas, electronic gas, etc ., and the gas holder, panel, valves and fittings and other equipment, parts and engineering services to our customers in China and worldwide; The products are involved in various industrial fields, such as semiconductor chip, solar cell, LED, TFT-LCD, optical fiber, glass, laser, medicine , etc., Our mission is to partner with our global customers to provide support, solutions and quality products that are innovative,reliable, and safe.
Our products mainly include: H2, O2, N2, Ar, CO2, propane, acetylene, helium, laser mixed gas,  SiH4, Sih2cl2, SiHCL3, SiCL4, NH3, CF4, NF3, SF6, HCL, N2O, doping mixed gas (TMB, PH3, B2H6) and other electronic gases.

China High Puritytrichlorosilane Gas 99.99% 4n Sihcl3 Gas
China High Puritytrichlorosilane Gas 99.99% 4n Sihcl3 Gas
 

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