|
| MOQ: | 1kg |
| Price: | US $50kg |
| Standard Packaging: | Cylinder/Tank |
| Delivery Period: | 15 days |
| Payment Method: | L/C, T/T |
| Supply Capacity: | 5000 Tons/Year |
Nitrogen trifluoride (NF3) is a chemical compound composed of one nitrogen atom bonded to three fluorine atoms. Here are some key points about nitrogen trifluoride:
Properties: Nitrogen trifluoride is a colorless, odorless gas at room temperature and pressure. It has a molecular formula of NF3 and a molecular weight of 71.0 g/mol. NF3 is a stable compound and does not readily react with common materials such as metals or water.
Production: Nitrogen trifluoride is primarily produced through the reaction of ammonia (NH3) with fluorine gas (F2). The reaction takes place in the presence of a catalyst and at elevated temperatures. Other methods of production involve the reaction of nitrogen gas (N2) with fluorine or the direct fluorination of nitrogen oxide compounds.
Applications: Nitrogen trifluoride has several industrial applications:
Semiconductor Industry: NF3 is widely used in the semiconductor manufacturing industry as a cleaning agent for removing silicon oxide and other contaminants from process equipment. It is particularly effective at removing residual silicon-based films in plasma etching processes.
LCD and Thin-Film Solar Panel Production: Nitrogen trifluoride is used in the production of liquid crystal display (LCD) panels and thin-film solar panels. It is employed as a cleaning gas to remove impurities and ensure the quality of the surfaces and films.
Chemical Industry: NF3 serves as a fluorination agent in various chemical reactions, such as the synthesis of organic fluorine compounds.
Environmental Impact: Nitrogen trifluoride is considered a potent greenhouse gas. It has a high global warming potential (GWP) and a long atmospheric lifetime. NF3 emissions have been increasing due to its expanding use in industries, and it contributes to the overall greenhouse gas effect and climate change. Efforts are being made to reduce NF3 emissions and improve its handling and disposal.
Safety Considerations: Nitrogen trifluoride is a toxic and corrosive gas. It should be handled with care, and proper safety measures should be followed, including the use of appropriate protective equipment and ventilation systems. NF3 can cause severe burns to the eyes, skin, and respiratory system upon direct contact or inhalation.
Basic Info
| Transport Package: | 47L, 440L | Melting Point | -206.79ºC |
| Trademark: | CMC | Boiling Point | -129.0ºC |
| Specification | 99.99%, 99.996% | Production Capacity | 5000 M3/Year |
| Cylinder Pressure | 15MPa/20MPa | Valve | Diss640 |
| Appearance | Colorless, Odorless | Density | 2.96 Kg/M3 |
Specifications:
| Specifications | Company Standard |
| NF3 | ≥ 99.996% |
| CF4 | ≤ 20 ppm |
| N2 | ≤ 5 ppm |
| O2+AR | ≤ 3 ppm |
| CO | ≤ 1 ppm |
| CO2 | ≤ 0.5 ppm |
| N2O | ≤ 1 ppm |
| SF6 | ≤ 2 ppm |
| Moisture | ≤ 1 ppm |
| Express as HF | ≤ 1 ppm |
Detailed Photo
|
|
| MOQ: | 1kg |
| Price: | US $50kg |
| Standard Packaging: | Cylinder/Tank |
| Delivery Period: | 15 days |
| Payment Method: | L/C, T/T |
| Supply Capacity: | 5000 Tons/Year |
Nitrogen trifluoride (NF3) is a chemical compound composed of one nitrogen atom bonded to three fluorine atoms. Here are some key points about nitrogen trifluoride:
Properties: Nitrogen trifluoride is a colorless, odorless gas at room temperature and pressure. It has a molecular formula of NF3 and a molecular weight of 71.0 g/mol. NF3 is a stable compound and does not readily react with common materials such as metals or water.
Production: Nitrogen trifluoride is primarily produced through the reaction of ammonia (NH3) with fluorine gas (F2). The reaction takes place in the presence of a catalyst and at elevated temperatures. Other methods of production involve the reaction of nitrogen gas (N2) with fluorine or the direct fluorination of nitrogen oxide compounds.
Applications: Nitrogen trifluoride has several industrial applications:
Semiconductor Industry: NF3 is widely used in the semiconductor manufacturing industry as a cleaning agent for removing silicon oxide and other contaminants from process equipment. It is particularly effective at removing residual silicon-based films in plasma etching processes.
LCD and Thin-Film Solar Panel Production: Nitrogen trifluoride is used in the production of liquid crystal display (LCD) panels and thin-film solar panels. It is employed as a cleaning gas to remove impurities and ensure the quality of the surfaces and films.
Chemical Industry: NF3 serves as a fluorination agent in various chemical reactions, such as the synthesis of organic fluorine compounds.
Environmental Impact: Nitrogen trifluoride is considered a potent greenhouse gas. It has a high global warming potential (GWP) and a long atmospheric lifetime. NF3 emissions have been increasing due to its expanding use in industries, and it contributes to the overall greenhouse gas effect and climate change. Efforts are being made to reduce NF3 emissions and improve its handling and disposal.
Safety Considerations: Nitrogen trifluoride is a toxic and corrosive gas. It should be handled with care, and proper safety measures should be followed, including the use of appropriate protective equipment and ventilation systems. NF3 can cause severe burns to the eyes, skin, and respiratory system upon direct contact or inhalation.
Basic Info
| Transport Package: | 47L, 440L | Melting Point | -206.79ºC |
| Trademark: | CMC | Boiling Point | -129.0ºC |
| Specification | 99.99%, 99.996% | Production Capacity | 5000 M3/Year |
| Cylinder Pressure | 15MPa/20MPa | Valve | Diss640 |
| Appearance | Colorless, Odorless | Density | 2.96 Kg/M3 |
Specifications:
| Specifications | Company Standard |
| NF3 | ≥ 99.996% |
| CF4 | ≤ 20 ppm |
| N2 | ≤ 5 ppm |
| O2+AR | ≤ 3 ppm |
| CO | ≤ 1 ppm |
| CO2 | ≤ 0.5 ppm |
| N2O | ≤ 1 ppm |
| SF6 | ≤ 2 ppm |
| Moisture | ≤ 1 ppm |
| Express as HF | ≤ 1 ppm |
Detailed Photo
