|
| MOQ: | 1kg |
| Price: | US $50/kg |
| Standard Packaging: | Cylinder/Tank |
| Delivery Period: | 15 days |
| Payment Method: | L/C, T/T |
| Supply Capacity: | 5000kg/month |
Nitrogen trifluoride (NF3) is a chemical compound composed of one nitrogen atom and three fluorine atoms. It is a colorless, odorless gas with a molecular formula of NF3. Here are some key points about nitrogen trifluoride:
1. Production: Nitrogen trifluoride is primarily produced through the reaction of ammonia (NH3) with fluorine gas (F2) under controlled conditions. The reaction is exothermic and usually occurs in the presence of a catalyst.
2. Physical properties: NF3 is a non-flammable gas that is stable at room temperature and pressure. It has a boiling point of -129.1°C (-204.4°F) and a melting point of -206.8°C (-340.2°F). The gas is denser than air and has a slightly sweet odor at high concentrations.
3. Applications: Nitrogen trifluoride has several industrial applications, including:
- Semiconductor manufacturing: NF3 is widely used in the electronics industry as a cleaning agent for removing impurities from the surfaces of silicon wafers during the fabrication of integrated circuits and thin-film transistors.
- Plasma etching: It is used as a plasma etchant in the production of microelectronic devices. NF3 reacts with silicon dioxide (SiO2), a common material in semiconductor manufacturing, to form volatile products that can be easily removed.
- Flat-panel display production: NF3 is employed in the manufacturing of liquid crystal displays (LCDs) and plasma displays to clean and etch glass surfaces.
- Solar panel manufacturing: It is used in the production of thin-film solar panels, where it helps remove impurities and residues from the panel surfaces.
4. Environmental impact: Nitrogen trifluoride is a potent greenhouse gas with a high global warming potential (GWP). It has a long atmospheric lifetime (around 550 years) and is estimated to have a GWP significantly higher than that of carbon dioxide (CO2). The release of NF3 into the atmosphere can contribute to climate change.
5. Safety considerations: NF3 is generally considered non-toxic but can be an asphyxiation hazard in high concentrations, displacing oxygen. It is also a powerful oxidizer and can support combustion. Proper handling, storage, and ventilation measures should be followed when working with nitrogen trifluoride.
Basic Info
| Transport Package: | 47L, 440L | Melting Point | -206.79ºC |
| Trademark: | CMC | Boiling Point | -129.0ºC |
| Specification | 99.99%, 99.996% | Production Capacity | 5000 M3/Year |
| Cylinder Pressure | 15MPa/20MPa | Valve | Diss640 |
| Appearance | Colorless, Odorless | Density | 2.96 Kg/M3 |
Specifications:
| Specifications | Company Standard |
| NF3 | ≥ 99.996% |
| CF4 | ≤ 20 ppm |
| N2 | ≤ 5 ppm |
| O2+AR | ≤ 3 ppm |
| CO | ≤ 1 ppm |
| CO2 | ≤ 0.5 ppm |
| N2O | ≤ 1 ppm |
| SF6 | ≤ 2 ppm |
| Moisture | ≤ 1 ppm |
| Express as HF | ≤ 1 ppm |
Detailed Photo
|
|
| MOQ: | 1kg |
| Price: | US $50/kg |
| Standard Packaging: | Cylinder/Tank |
| Delivery Period: | 15 days |
| Payment Method: | L/C, T/T |
| Supply Capacity: | 5000kg/month |
Nitrogen trifluoride (NF3) is a chemical compound composed of one nitrogen atom and three fluorine atoms. It is a colorless, odorless gas with a molecular formula of NF3. Here are some key points about nitrogen trifluoride:
1. Production: Nitrogen trifluoride is primarily produced through the reaction of ammonia (NH3) with fluorine gas (F2) under controlled conditions. The reaction is exothermic and usually occurs in the presence of a catalyst.
2. Physical properties: NF3 is a non-flammable gas that is stable at room temperature and pressure. It has a boiling point of -129.1°C (-204.4°F) and a melting point of -206.8°C (-340.2°F). The gas is denser than air and has a slightly sweet odor at high concentrations.
3. Applications: Nitrogen trifluoride has several industrial applications, including:
- Semiconductor manufacturing: NF3 is widely used in the electronics industry as a cleaning agent for removing impurities from the surfaces of silicon wafers during the fabrication of integrated circuits and thin-film transistors.
- Plasma etching: It is used as a plasma etchant in the production of microelectronic devices. NF3 reacts with silicon dioxide (SiO2), a common material in semiconductor manufacturing, to form volatile products that can be easily removed.
- Flat-panel display production: NF3 is employed in the manufacturing of liquid crystal displays (LCDs) and plasma displays to clean and etch glass surfaces.
- Solar panel manufacturing: It is used in the production of thin-film solar panels, where it helps remove impurities and residues from the panel surfaces.
4. Environmental impact: Nitrogen trifluoride is a potent greenhouse gas with a high global warming potential (GWP). It has a long atmospheric lifetime (around 550 years) and is estimated to have a GWP significantly higher than that of carbon dioxide (CO2). The release of NF3 into the atmosphere can contribute to climate change.
5. Safety considerations: NF3 is generally considered non-toxic but can be an asphyxiation hazard in high concentrations, displacing oxygen. It is also a powerful oxidizer and can support combustion. Proper handling, storage, and ventilation measures should be followed when working with nitrogen trifluoride.
Basic Info
| Transport Package: | 47L, 440L | Melting Point | -206.79ºC |
| Trademark: | CMC | Boiling Point | -129.0ºC |
| Specification | 99.99%, 99.996% | Production Capacity | 5000 M3/Year |
| Cylinder Pressure | 15MPa/20MPa | Valve | Diss640 |
| Appearance | Colorless, Odorless | Density | 2.96 Kg/M3 |
Specifications:
| Specifications | Company Standard |
| NF3 | ≥ 99.996% |
| CF4 | ≤ 20 ppm |
| N2 | ≤ 5 ppm |
| O2+AR | ≤ 3 ppm |
| CO | ≤ 1 ppm |
| CO2 | ≤ 0.5 ppm |
| N2O | ≤ 1 ppm |
| SF6 | ≤ 2 ppm |
| Moisture | ≤ 1 ppm |
| Express as HF | ≤ 1 ppm |
Detailed Photo
