|
| MOQ: | 1 Piece |
| Price: | US $ 15/PC |
| Standard Packaging: | Cylinder/Tank |
| Delivery Period: | 15 days |
| Payment Method: | L/C, T/T |
| Supply Capacity: | 200 Tons/Year |
Tungsten hexafluoride gas, also known as WF6, is a chemical compound consisting of one tungsten atom and six fluorine atoms. It is a colorless, nonflammable gas with a pungent odor. Tungsten hexafluoride is primarily used in the semiconductor industry for the deposition of tungsten thin films during the manufacturing of integrated circuits and other electronic devices.
Here are some key points about tungsten hexafluoride gas:
Deposition of Tungsten Films: Tungsten hexafluoride is widely employed as a precursor gas in chemical vapor deposition (CVD) processes to deposit tungsten thin films. These films serve as conductive layers in the fabrication of microelectronic devices, such as transistors, interconnects, and gate electrodes.
High Purity and Stability: WF6 gas is typically available in high-purity grades to ensure the quality and integrity of the deposited tungsten films. It exhibits good thermal stability, allowing for controlled and uniform film growth under specific process conditions.
CVD Process: During the CVD process, tungsten hexafluoride gas is introduced into a deposition chamber along with a reducing agent, such as hydrogen gas. The WF6 molecules decompose at elevated temperatures, depositing tungsten atoms onto the substrate surface in a controlled manner.
Safety Considerations: Tungsten hexafluoride is a highly toxic and corrosive gas, requiring careful handling and storage. It reacts violently with water and can release toxic hydrogen fluoride gas. Proper safety measures, including the use of specialized equipment and protective gear, are essential when working with WF6.
Environmental Impact: Like other fluorinated compounds, tungsten hexafluoride has the potential to contribute to environmental concerns. Careful management and disposal practices are necessary to prevent its release into the environment.
It is important to note that tungsten hexafluoride gas is primarily used in industrial and specialized applications, and its handling requires expertise and adherence to safety protocols.
| Test items | Units | Quality requirements | Test results |
| CF4 | ppm | <0.5 | <0.01 |
| O2 | ppm | <0.5 | <0.01 |
| N2 | ppm | <1 | 0.03 |
| CO | ppm | <0.5 | <0.02 |
| CO2 | ppm | <0.5 | <0.01 |
| SiF4 | ppm | <0.5 | <0.1 |
| SF6 | ppm | <0.5 | <0.1 |
| HF | ppm | <5 | 0.19 |
| Al | ppb | ≤10 | <0.020 |
| As | ppb | ≤10 | <0.001 |
| B | ppb | ≤10 | <0.005 |
| Ca | ppb | ≤5 | <0.200 |
| Cd | ppb | ≤2 | <0.001 |
| Cr | ppb | ≤10 | <0.020 |
| Fe | ppb | ≤10 | <0.007 |
| K | ppb | ≤5 | <0.100 |
| Mn | ppb | ≤10 | <0.001 |
| Na | ppb | ≤5 | <0.040 |
| Th | ppb | ≤0.1 | <0.001 |
| Ti | ppb | ≤10 | <0.002 |
| Li | ppb | ≤10 | <0.002 |
| U | ppb | ≤0.05 | <0.001 |
| Zn | ppb | ≤10 | <0.005 |
| Si | ppb | ≤10 | <0.100 |
| Pb | ppb | ≤10 | <0.001 |
| P | ppb | ≤2 | <0.300 |
| Mg | ppb | ≤10 | <0.020 |
| Ni | ppb | ≤20 | <0.030 |
| Cu | ppb | ≤5 | <0.005 |
| Mo | ppb | ≤10 | <0.001 |
| Total impurities of other metal | ppb | ≤500 | <0.0010 |
|
|
| MOQ: | 1 Piece |
| Price: | US $ 15/PC |
| Standard Packaging: | Cylinder/Tank |
| Delivery Period: | 15 days |
| Payment Method: | L/C, T/T |
| Supply Capacity: | 200 Tons/Year |
Tungsten hexafluoride gas, also known as WF6, is a chemical compound consisting of one tungsten atom and six fluorine atoms. It is a colorless, nonflammable gas with a pungent odor. Tungsten hexafluoride is primarily used in the semiconductor industry for the deposition of tungsten thin films during the manufacturing of integrated circuits and other electronic devices.
Here are some key points about tungsten hexafluoride gas:
Deposition of Tungsten Films: Tungsten hexafluoride is widely employed as a precursor gas in chemical vapor deposition (CVD) processes to deposit tungsten thin films. These films serve as conductive layers in the fabrication of microelectronic devices, such as transistors, interconnects, and gate electrodes.
High Purity and Stability: WF6 gas is typically available in high-purity grades to ensure the quality and integrity of the deposited tungsten films. It exhibits good thermal stability, allowing for controlled and uniform film growth under specific process conditions.
CVD Process: During the CVD process, tungsten hexafluoride gas is introduced into a deposition chamber along with a reducing agent, such as hydrogen gas. The WF6 molecules decompose at elevated temperatures, depositing tungsten atoms onto the substrate surface in a controlled manner.
Safety Considerations: Tungsten hexafluoride is a highly toxic and corrosive gas, requiring careful handling and storage. It reacts violently with water and can release toxic hydrogen fluoride gas. Proper safety measures, including the use of specialized equipment and protective gear, are essential when working with WF6.
Environmental Impact: Like other fluorinated compounds, tungsten hexafluoride has the potential to contribute to environmental concerns. Careful management and disposal practices are necessary to prevent its release into the environment.
It is important to note that tungsten hexafluoride gas is primarily used in industrial and specialized applications, and its handling requires expertise and adherence to safety protocols.
| Test items | Units | Quality requirements | Test results |
| CF4 | ppm | <0.5 | <0.01 |
| O2 | ppm | <0.5 | <0.01 |
| N2 | ppm | <1 | 0.03 |
| CO | ppm | <0.5 | <0.02 |
| CO2 | ppm | <0.5 | <0.01 |
| SiF4 | ppm | <0.5 | <0.1 |
| SF6 | ppm | <0.5 | <0.1 |
| HF | ppm | <5 | 0.19 |
| Al | ppb | ≤10 | <0.020 |
| As | ppb | ≤10 | <0.001 |
| B | ppb | ≤10 | <0.005 |
| Ca | ppb | ≤5 | <0.200 |
| Cd | ppb | ≤2 | <0.001 |
| Cr | ppb | ≤10 | <0.020 |
| Fe | ppb | ≤10 | <0.007 |
| K | ppb | ≤5 | <0.100 |
| Mn | ppb | ≤10 | <0.001 |
| Na | ppb | ≤5 | <0.040 |
| Th | ppb | ≤0.1 | <0.001 |
| Ti | ppb | ≤10 | <0.002 |
| Li | ppb | ≤10 | <0.002 |
| U | ppb | ≤0.05 | <0.001 |
| Zn | ppb | ≤10 | <0.005 |
| Si | ppb | ≤10 | <0.100 |
| Pb | ppb | ≤10 | <0.001 |
| P | ppb | ≤2 | <0.300 |
| Mg | ppb | ≤10 | <0.020 |
| Ni | ppb | ≤20 | <0.030 |
| Cu | ppb | ≤5 | <0.005 |
| Mo | ppb | ≤10 | <0.001 |
| Total impurities of other metal | ppb | ≤500 | <0.0010 |
