|
| MOQ: | 1kg |
| Price: | US $40/kg |
| Standard Packaging: | Cylinder/Tank |
| Delivery Period: | 15 days |
| Payment Method: | L/C, T/T |
| Supply Capacity: | 50000kg/month |
Hexachlorodisilane (Si2Cl6) is an inorganic compound consisting of two silicon (Si) atoms bonded together with six chlorine (Cl) atoms. It is a colorless gas that is primarily used as a precursor in the production of silicon-based materials. Here are some key points about hexachlorodisilane gas:
Structure and Properties: Hexachlorodisilane has a tetrahedral molecular structure, with each silicon atom bonded to three chlorine atoms and the other silicon atom. It is a volatile and reactive compound, and its boiling point is around 140 °C.
Synthesis and Production: Hexachlorodisilane is typically synthesized by the reaction of silicon tetrachloride (SiCl4) with elemental silicon (Si) or silicon powder at high temperatures. It can also be produced through the reaction of silicon with chlorine gas (Cl2).
Applications:
Semiconductor Industry: Hexachlorodisilane is a crucial precursor in the production of various silicon-based thin films for the semiconductor industry. It is used in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to deposit silicon-containing layers with high purity and uniformity.
Silicon Nitride Production: Hexachlorodisilane can be used as a precursor for the synthesis of silicon nitride (Si3N4) ceramics. It reacts with ammonia (NH3) to form silicon nitride, which is used in the manufacturing of ceramics, cutting tools, and protective coatings.
Surface Modification: Hexachlorodisilane is employed as a surface treatment agent to modify the surface properties of materials. It can enhance hydrophobic or hydrophilic characteristics, improve adhesion, or provide chemical resistance to surfaces.
Safety Considerations: Hexachlorodisilane is a highly reactive and volatile compound. It is corrosive to metals and can cause severe burns upon contact with the skin or eyes. It is also toxic if inhaled or ingested. Proper handling, storage, and personal protective equipment should be used when working with hexachlorodisilane or any other hazardous chemicals.
Hexachlorodisilane gas is an important precursor in the semiconductor industry and the production of silicon-based materials. Its reactivity and ability to deposit high-quality silicon films make it valuable for various technological applications. However, it should be handled with caution due to its hazardous properties.
Basic Info.
| Model NO. | Si2Cl6 | Grade Standard | Electron Grade |
| Transport Package | Cylinder, Canister | Specification | 40L, 200L |
| Trademark | CMC | Origin | Suzhou, China |
| HS Code | 2812190091 | Production Capacity | 100t/Year |
Specifications:
| IUPAC name | Hexachlorodisilane |
| Other names | Disilicon hexachloride |
| Identifiers | |
| CAS No.: | 13465-77-5 |
| EC No.: | 236-704-1 |
| Properties | |
| Molecular Formula: | Si2Cl6 |
| Molar mass: | 268.88 g/mol |
| Appearance: | Colorless liquid |
| Melting point: | ≤20 °C |
| Boiling point: | 144 °C (291 °F; 417 K) |
| Flash point: | >93°C |
| Vopor density(Air=1): | >1 |
| Relative density(Water=1): | 1.562 |
| Test Items | Units | Specifications | Test Result |
| Assay by GC | wt% | ≥99.9 | 99.905 |
| Li | ng/g | ≤0.5 | <0.05 |
| Na | ng/g | ≤0.5 | <0.05 |
| Mg | ng/g | ≤0.5 | <0.05 |
| Al | ng/g | ≤1.0 | 0.35 |
| K | ng/g | ≤0.5 | 0.08 |
| Ca | ng/g | ≤0.5 | 0.16 |
| Ti | ng/g | ≤1.0 | 0.18 |
| Cr | ng/g | ≤0.5 | <0.05 |
| Mn | ng/g | ≤0.5 | <0.05 |
| Fe | ng/g | ≤1.0 | 0.48 |
| Co | ng/g | ≤0.5 | <0.05 |
| Ni | ng/g | ≤0.5 | 0.06 |
| Cu | ng/g | ≤0.5 | <0.05 |
| Zn | ng/g | ≤0.5 | <0.05 |
|
|
| MOQ: | 1kg |
| Price: | US $40/kg |
| Standard Packaging: | Cylinder/Tank |
| Delivery Period: | 15 days |
| Payment Method: | L/C, T/T |
| Supply Capacity: | 50000kg/month |
Hexachlorodisilane (Si2Cl6) is an inorganic compound consisting of two silicon (Si) atoms bonded together with six chlorine (Cl) atoms. It is a colorless gas that is primarily used as a precursor in the production of silicon-based materials. Here are some key points about hexachlorodisilane gas:
Structure and Properties: Hexachlorodisilane has a tetrahedral molecular structure, with each silicon atom bonded to three chlorine atoms and the other silicon atom. It is a volatile and reactive compound, and its boiling point is around 140 °C.
Synthesis and Production: Hexachlorodisilane is typically synthesized by the reaction of silicon tetrachloride (SiCl4) with elemental silicon (Si) or silicon powder at high temperatures. It can also be produced through the reaction of silicon with chlorine gas (Cl2).
Applications:
Semiconductor Industry: Hexachlorodisilane is a crucial precursor in the production of various silicon-based thin films for the semiconductor industry. It is used in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to deposit silicon-containing layers with high purity and uniformity.
Silicon Nitride Production: Hexachlorodisilane can be used as a precursor for the synthesis of silicon nitride (Si3N4) ceramics. It reacts with ammonia (NH3) to form silicon nitride, which is used in the manufacturing of ceramics, cutting tools, and protective coatings.
Surface Modification: Hexachlorodisilane is employed as a surface treatment agent to modify the surface properties of materials. It can enhance hydrophobic or hydrophilic characteristics, improve adhesion, or provide chemical resistance to surfaces.
Safety Considerations: Hexachlorodisilane is a highly reactive and volatile compound. It is corrosive to metals and can cause severe burns upon contact with the skin or eyes. It is also toxic if inhaled or ingested. Proper handling, storage, and personal protective equipment should be used when working with hexachlorodisilane or any other hazardous chemicals.
Hexachlorodisilane gas is an important precursor in the semiconductor industry and the production of silicon-based materials. Its reactivity and ability to deposit high-quality silicon films make it valuable for various technological applications. However, it should be handled with caution due to its hazardous properties.
Basic Info.
| Model NO. | Si2Cl6 | Grade Standard | Electron Grade |
| Transport Package | Cylinder, Canister | Specification | 40L, 200L |
| Trademark | CMC | Origin | Suzhou, China |
| HS Code | 2812190091 | Production Capacity | 100t/Year |
Specifications:
| IUPAC name | Hexachlorodisilane |
| Other names | Disilicon hexachloride |
| Identifiers | |
| CAS No.: | 13465-77-5 |
| EC No.: | 236-704-1 |
| Properties | |
| Molecular Formula: | Si2Cl6 |
| Molar mass: | 268.88 g/mol |
| Appearance: | Colorless liquid |
| Melting point: | ≤20 °C |
| Boiling point: | 144 °C (291 °F; 417 K) |
| Flash point: | >93°C |
| Vopor density(Air=1): | >1 |
| Relative density(Water=1): | 1.562 |
| Test Items | Units | Specifications | Test Result |
| Assay by GC | wt% | ≥99.9 | 99.905 |
| Li | ng/g | ≤0.5 | <0.05 |
| Na | ng/g | ≤0.5 | <0.05 |
| Mg | ng/g | ≤0.5 | <0.05 |
| Al | ng/g | ≤1.0 | 0.35 |
| K | ng/g | ≤0.5 | 0.08 |
| Ca | ng/g | ≤0.5 | 0.16 |
| Ti | ng/g | ≤1.0 | 0.18 |
| Cr | ng/g | ≤0.5 | <0.05 |
| Mn | ng/g | ≤0.5 | <0.05 |
| Fe | ng/g | ≤1.0 | 0.48 |
| Co | ng/g | ≤0.5 | <0.05 |
| Ni | ng/g | ≤0.5 | 0.06 |
| Cu | ng/g | ≤0.5 | <0.05 |
| Zn | ng/g | ≤0.5 | <0.05 |
