logo
Send Message
products
PRODUCTS DETAILS
Home > Products >
Depositing tungsten metal films Semiconductor application Gas Tungsten Hexafluoride

Depositing tungsten metal films Semiconductor application Gas Tungsten Hexafluoride

MOQ: 1 Piece
Price: US $ 15/PC
Standard Packaging: Cylinder/Tank
Delivery Period: 15 days
Payment Method: L/C, T/T
Supply Capacity: 200 Tons/Year
Detail Information
Place of Origin
China
Brand Name
CMC
Certification
COA
Model Number
Wf6
Product Name:
Tungsten Hexafluoride
Appearance:
Colorless
Transport:
By Sea
Purity:
99.999%
Model No.:
Tungsten Hexafluoride
Transport Package:
10L 40L 50L
Specification:
10L 40L 50L
Trademark:
CMC
Origin:
China
HS Code:
2812190091
Supply Ability:
200t/Year
CAS No.:
7783-82-6
Formula:
Wf6
EINECS:
232-029-1
Constituent:
Industrial Pure Air
Grade Standard:
Industrial Grade
Chemical Property:
Combustion-Supporting Gas
Customization:
Available | Customized Request
Minimum Order Quantity:
1 Piece
Price:
US $ 15/PC
Packaging Details:
Cylinder/Tank
Delivery Time:
15 days
Payment Terms:
L/C, T/T
Supply Ability:
200 Tons/Year
Product Description

Product Description

Tungsten hexafluoride gas, often abbreviated as WF6, is a chemical compound composed of tungsten (W) and fluorine (F). It is a colorless, corrosive, and highly reactive gas. Here are some key points about tungsten hexafluoride gas:

  1. Chemical Formula and Structure: Tungsten hexafluoride has the chemical formula WF6. It consists of one tungsten atom bonded to six fluorine atoms, forming an octahedral molecular geometry.

  2. Physical Properties: Tungsten hexafluoride is a dense gas with a molecular weight of 297.84 g/mol. It has a boiling point of approximately 17.1°C (62.8°F) and is typically stored and handled in its liquid form under controlled conditions.

  3. Reactivity: WF6 is highly reactive and readily reacts with a variety of substances. It reacts vigorously with water, moisture, and oxygen, releasing toxic hydrogen fluoride (HF) gas. Due to its reactivity, WF6 is commonly used as a fluorine source in various chemical processes.

  4. Applications: Tungsten hexafluoride gas has several industrial applications, including:

    • Semiconductor Industry: WF6 is used as a precursor in the production of tungsten films or layers in semiconductor manufacturing processes, such as chemical vapor deposition (CVD) and atomic layer deposition (ALD). It serves as a source of tungsten for depositing thin films on integrated circuits and other electronic devices.

    • Metal-Organic Chemical Vapor Deposition (MOCVD): WF6 is utilized in MOCVD processes to deposit tungsten films in the production of high-brightness light-emitting diodes (LEDs) and other optoelectronic devices.

    • Surface Treatment: WF6 is employed in surface treatment applications, such as etching and cleaning of metals, ceramics, and glass surfaces.

    • Research and Development: Tungsten hexafluoride gas is sometimes used in research laboratories as a source of tungsten or as a fluorine-containing reagent in various chemical reactions.

  5. Safety Considerations: Tungsten hexafluoride is a toxic and corrosive gas. It reacts with moisture in the air to produce hydrogen fluoride, which is highly corrosive and can cause severe burns. Proper handling, storage, and disposal procedures, along with the use of appropriate personal protective equipment, are essential to ensure worker safety.

It is important to note that the specific applications, handling procedures, and safety considerations for tungsten hexafluoride gas may vary depending on the industry and intended use. It is recommended to consult relevant safety guidelines, regulations, and the material safety data sheet (MSDS) provided by the manufacturer for comprehensive information on the safe handling and usage of WF6.

                               Depositing tungsten metal films Semiconductor application  Gas Tungsten Hexafluoride 0
Overview

Basic Info.

Model NO. WF6 Transport Package Cylinder
Specification 10L/15kg Trademark CMC
Origin Suzhou, China HS Code 2812190091
Production Capacity 200t/Year    

Product Spec:


ungsten Hexafluoride WF6 GAS 
CAS No.: 7783-82-6
EINECS No.: 232-029-1
UN No.: UN2196
Purity: 99.999%
Dot Class: 2.3  
Appearance: Colorless
Grade Standard: Electron Grade,Industrial Grade



The COA of Product:
 
Test items Units Quality requirements Test results
CF4 ppm <0.5 <0.01
O2 ppm <0.5 <0.01
N2 ppm <1 0.03
CO ppm <0.5 <0.02
CO2 ppm <0.5 <0.01
SiF4 ppm <0.5 <0.1
SF6 ppm <0.5 <0.1
HF ppm <5 0.19
Al ppb ≤10 <0.020
As ppb ≤10 <0.001
B ppb ≤10 <0.005
Ca ppb ≤5 <0.200
Cd ppb ≤2 <0.001
Cr ppb ≤10 <0.020
Fe ppb ≤10 <0.007
K ppb ≤5 <0.100
Mn ppb ≤10 <0.001
Na ppb ≤5 <0.040
Th ppb ≤0.1 <0.001
Ti ppb ≤10 <0.002
Li ppb ≤10 <0.002
U ppb ≤0.05 <0.001
Zn ppb ≤10 <0.005
Si ppb ≤10 <0.100
Pb ppb ≤10 <0.001
P ppb ≤2 <0.300
Mg ppb ≤10 <0.020
Ni ppb ≤20 <0.030
Cu ppb ≤5 <0.005
Mo ppb ≤10 <0.001
Total impurities of other metal ppb ≤500

China Semiconductor Industry Electronic Grade Tungsten Hexafluoride Wf6 Gas
Shanghai Kemike Chemical Co., Ltd is staffed by trained personnel, combine many years experience in Gas industry .We supply cylinder gas, electronic gas, etc ., and the gas holder, panel, valves and fittings and other equipment, parts and engineering services to our customers in China and worldwide; The products are involved in various industrial fields, such as semiconductor chip, solar cell, LED, TFT-LCD, optical fiber, glass, laser, medicine , etc., Our mission is to partner with our global customers to provide support, solutions and quality products that are innovative,reliable, and safe.
Our products mainly include: H2, O2, N2, Ar, CO2, propane, acetylene, helium, laser mixed gas,  SiH4, Sih2cl2, SiHCL3, SiCL4, NH3, CF4, NF3, SF6, HCL, N2O, doping mixed gas (TMB, PH3, B2H6) and other electronic gases.
China Semiconductor Industry Electronic Grade Tungsten Hexafluoride Wf6 GasChina Semiconductor Industry Electronic Grade Tungsten Hexafluoride Wf6 Gas
products
PRODUCTS DETAILS
Depositing tungsten metal films Semiconductor application Gas Tungsten Hexafluoride
MOQ: 1 Piece
Price: US $ 15/PC
Standard Packaging: Cylinder/Tank
Delivery Period: 15 days
Payment Method: L/C, T/T
Supply Capacity: 200 Tons/Year
Detail Information
Place of Origin
China
Brand Name
CMC
Certification
COA
Model Number
Wf6
Product Name:
Tungsten Hexafluoride
Appearance:
Colorless
Transport:
By Sea
Purity:
99.999%
Model No.:
Tungsten Hexafluoride
Transport Package:
10L 40L 50L
Specification:
10L 40L 50L
Trademark:
CMC
Origin:
China
HS Code:
2812190091
Supply Ability:
200t/Year
CAS No.:
7783-82-6
Formula:
Wf6
EINECS:
232-029-1
Constituent:
Industrial Pure Air
Grade Standard:
Industrial Grade
Chemical Property:
Combustion-Supporting Gas
Customization:
Available | Customized Request
Minimum Order Quantity:
1 Piece
Price:
US $ 15/PC
Packaging Details:
Cylinder/Tank
Delivery Time:
15 days
Payment Terms:
L/C, T/T
Supply Ability:
200 Tons/Year
Product Description

Product Description

Tungsten hexafluoride gas, often abbreviated as WF6, is a chemical compound composed of tungsten (W) and fluorine (F). It is a colorless, corrosive, and highly reactive gas. Here are some key points about tungsten hexafluoride gas:

  1. Chemical Formula and Structure: Tungsten hexafluoride has the chemical formula WF6. It consists of one tungsten atom bonded to six fluorine atoms, forming an octahedral molecular geometry.

  2. Physical Properties: Tungsten hexafluoride is a dense gas with a molecular weight of 297.84 g/mol. It has a boiling point of approximately 17.1°C (62.8°F) and is typically stored and handled in its liquid form under controlled conditions.

  3. Reactivity: WF6 is highly reactive and readily reacts with a variety of substances. It reacts vigorously with water, moisture, and oxygen, releasing toxic hydrogen fluoride (HF) gas. Due to its reactivity, WF6 is commonly used as a fluorine source in various chemical processes.

  4. Applications: Tungsten hexafluoride gas has several industrial applications, including:

    • Semiconductor Industry: WF6 is used as a precursor in the production of tungsten films or layers in semiconductor manufacturing processes, such as chemical vapor deposition (CVD) and atomic layer deposition (ALD). It serves as a source of tungsten for depositing thin films on integrated circuits and other electronic devices.

    • Metal-Organic Chemical Vapor Deposition (MOCVD): WF6 is utilized in MOCVD processes to deposit tungsten films in the production of high-brightness light-emitting diodes (LEDs) and other optoelectronic devices.

    • Surface Treatment: WF6 is employed in surface treatment applications, such as etching and cleaning of metals, ceramics, and glass surfaces.

    • Research and Development: Tungsten hexafluoride gas is sometimes used in research laboratories as a source of tungsten or as a fluorine-containing reagent in various chemical reactions.

  5. Safety Considerations: Tungsten hexafluoride is a toxic and corrosive gas. It reacts with moisture in the air to produce hydrogen fluoride, which is highly corrosive and can cause severe burns. Proper handling, storage, and disposal procedures, along with the use of appropriate personal protective equipment, are essential to ensure worker safety.

It is important to note that the specific applications, handling procedures, and safety considerations for tungsten hexafluoride gas may vary depending on the industry and intended use. It is recommended to consult relevant safety guidelines, regulations, and the material safety data sheet (MSDS) provided by the manufacturer for comprehensive information on the safe handling and usage of WF6.

                               Depositing tungsten metal films Semiconductor application  Gas Tungsten Hexafluoride 0
Overview

Basic Info.

Model NO. WF6 Transport Package Cylinder
Specification 10L/15kg Trademark CMC
Origin Suzhou, China HS Code 2812190091
Production Capacity 200t/Year    

Product Spec:


ungsten Hexafluoride WF6 GAS 
CAS No.: 7783-82-6
EINECS No.: 232-029-1
UN No.: UN2196
Purity: 99.999%
Dot Class: 2.3  
Appearance: Colorless
Grade Standard: Electron Grade,Industrial Grade



The COA of Product:
 
Test items Units Quality requirements Test results
CF4 ppm <0.5 <0.01
O2 ppm <0.5 <0.01
N2 ppm <1 0.03
CO ppm <0.5 <0.02
CO2 ppm <0.5 <0.01
SiF4 ppm <0.5 <0.1
SF6 ppm <0.5 <0.1
HF ppm <5 0.19
Al ppb ≤10 <0.020
As ppb ≤10 <0.001
B ppb ≤10 <0.005
Ca ppb ≤5 <0.200
Cd ppb ≤2 <0.001
Cr ppb ≤10 <0.020
Fe ppb ≤10 <0.007
K ppb ≤5 <0.100
Mn ppb ≤10 <0.001
Na ppb ≤5 <0.040
Th ppb ≤0.1 <0.001
Ti ppb ≤10 <0.002
Li ppb ≤10 <0.002
U ppb ≤0.05 <0.001
Zn ppb ≤10 <0.005
Si ppb ≤10 <0.100
Pb ppb ≤10 <0.001
P ppb ≤2 <0.300
Mg ppb ≤10 <0.020
Ni ppb ≤20 <0.030
Cu ppb ≤5 <0.005
Mo ppb ≤10 <0.001
Total impurities of other metal ppb ≤500

China Semiconductor Industry Electronic Grade Tungsten Hexafluoride Wf6 Gas
Shanghai Kemike Chemical Co., Ltd is staffed by trained personnel, combine many years experience in Gas industry .We supply cylinder gas, electronic gas, etc ., and the gas holder, panel, valves and fittings and other equipment, parts and engineering services to our customers in China and worldwide; The products are involved in various industrial fields, such as semiconductor chip, solar cell, LED, TFT-LCD, optical fiber, glass, laser, medicine , etc., Our mission is to partner with our global customers to provide support, solutions and quality products that are innovative,reliable, and safe.
Our products mainly include: H2, O2, N2, Ar, CO2, propane, acetylene, helium, laser mixed gas,  SiH4, Sih2cl2, SiHCL3, SiCL4, NH3, CF4, NF3, SF6, HCL, N2O, doping mixed gas (TMB, PH3, B2H6) and other electronic gases.
China Semiconductor Industry Electronic Grade Tungsten Hexafluoride Wf6 GasChina Semiconductor Industry Electronic Grade Tungsten Hexafluoride Wf6 Gas
Sitemap |  Privacy Policy | China Good Quality Specialty Cylinder Gas Supplier. Copyright © 2023-2024 gascylindertank.com . All Rights Reserved.